JPH0341847U - - Google Patents
Info
- Publication number
- JPH0341847U JPH0341847U JP10291489U JP10291489U JPH0341847U JP H0341847 U JPH0341847 U JP H0341847U JP 10291489 U JP10291489 U JP 10291489U JP 10291489 U JP10291489 U JP 10291489U JP H0341847 U JPH0341847 U JP H0341847U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- film
- forming
- substrate
- reactive gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10291489U JPH0341847U (en]) | 1989-08-31 | 1989-08-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10291489U JPH0341847U (en]) | 1989-08-31 | 1989-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0341847U true JPH0341847U (en]) | 1991-04-22 |
Family
ID=31651783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10291489U Pending JPH0341847U (en]) | 1989-08-31 | 1989-08-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0341847U (en]) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05148654A (ja) * | 1991-11-28 | 1993-06-15 | Shinko Seiki Co Ltd | パルスプラズマｃｖｄによる成膜方法及びその装置 |
| JPH07106259A (ja) * | 1993-10-04 | 1995-04-21 | Sumitomo Metal Ind Ltd | 薄膜形成装置及び薄膜形成方法 |
| JP2008159945A (ja) * | 2006-12-25 | 2008-07-10 | Tokyo Electron Ltd | 成膜装置および成膜方法 |
| WO2022255215A1 (ja) * | 2021-06-04 | 2022-12-08 | 東京エレクトロン株式会社 | 基板処理装置 |
-
1989
- 1989-08-31 JP JP10291489U patent/JPH0341847U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05148654A (ja) * | 1991-11-28 | 1993-06-15 | Shinko Seiki Co Ltd | パルスプラズマｃｖｄによる成膜方法及びその装置 |
| JPH07106259A (ja) * | 1993-10-04 | 1995-04-21 | Sumitomo Metal Ind Ltd | 薄膜形成装置及び薄膜形成方法 |
| JP2008159945A (ja) * | 2006-12-25 | 2008-07-10 | Tokyo Electron Ltd | 成膜装置および成膜方法 |
| WO2022255215A1 (ja) * | 2021-06-04 | 2022-12-08 | 東京エレクトロン株式会社 | 基板処理装置 |
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